Magnetron sputtering coating machine is usually used for direct sputtering coating for different substrates, such as kinds of plastic, glass, metal, ceramic, etc.
We have dedicated more than 16 years to manufacturing and designing magnetrons that can be rectangular, cylindrical, circular, and of various sizes. They have developed a plethora of targets that can be directly cooled or bonded, and can be manufactured in such a way that can fit most magnetron sizes.
Magnetic fields can essentially define the behaviour and the properties of the ion charged particles that are used for sputtering. The development and commercialisation of software that can enable the distinct modelling of magnetron sputtering is bound to enhance its productivity, applicability, and reproducibility.
Magnetron sputter coating machine can coat metals, alloys, compounds, semiconductors, ceramics, dielectric composite films and other chemical reaction films. It is suitable for plating various single-layer films, multi-layer films, and alloy films. It can be plated Magnetic materials and non-magnetic materials.
Main Specifications for SP-1000
1. Vacuum chamber: D1000XH1100mm, front open door, made of carbon steel or stainless steel 304
2. Vacuum pumping system:
KT-500C diffusion pump(1 unit), molecular pump is optional
ZJP-150 roots pump(1 unit)
2X-70 mechanical pump(1 unit)
3. Mass flow controller: 3 sets, for N2, Ar2, C2H2, etc, or more gas MFC
4. Heating system: Optional
5. Coating system: DC or MF sputtering system, arc deposition system is optional
6. Power sources: Sputtering power sources
7. Controlling system: PLC control
